I developed a new flysecond laser plasma element lithography technology can process graphene

10, the reporter from the Chinese Academy of Sciences Chun Optical Precision Machinery and Physics Research Institute was informed that researchers from the Institute and other units, developed a new flysecond laser plasma kinelithography technology (FPL). Using this technology, the researchers achieved rapid preparation of high-quality micro-nanocycle structures on the surface of the 100 nano-thick silicon-based graphene oxide film. The results are published in Light: Science and Applications.

I developed a new flysecond laser plasma element lithography technology can process graphene

Since graphene was discovered, two-dimensional materials have gradually entered people’s field of vision and become a hot research topic in the field of materials. Technology such as self-assembly, electron beam etching and ultra-violet lithography can prepare micro-nanostructures on graphene, and then regulate its band gap, absorption, carrier migration rate and other properties. However, these technologies have long time-consuming, costly, lack of common altogether and so on. Therefore, how to reduce costs and efficiently prepare microstructure graphene is an important problem that needs to be solved.

Fesbsecond laser processing technology is widely used in the field of ultra-fine micronano processing in a variety of materials due to its unique advantages of ultra-high peak power and ultra-short pulse duration. However, taking laser write as an example, although its accuracy is very high, but in the ultra-fine microna preparation, the efficiency still needs to be improved. At the same time, ensuring processing accuracy and processing efficiency is one of the main problems that need to be solved in this technology. “How to solve the problem of processing accuracy and processing efficiency by flexible and simple processing method is the key to expand the practicality of fly-second laser.” Yang Jianjun, a researcher at the Institute of Optical Precision Machinery and Physics of the Chinese Academy of Sciences, said.

The study proves for the first time that FPL technology can achieve rapid preparation of large areas of high-quality submicron periodic structure in two-dimensional thin-film materials. Thanks to the nonlinear optical characteristics of the fethoflilaser, fPL technology processing process is not susceptible to material surface defects, impurities and other factors, and the processing substrate is not easily limited by the type of material. The processed material exhibits excellent mechanical properties and can be completely transferred using traditional wet transfer methods. This lays the foundation for the flexible preparation of periodic micro-nanostructures of related materials.